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The industry is gradually migrating toward chips based on finFET transistors at 16nm/14nm and beyond, but manufacturing those finFETs is proving to be a daunting challenge in the fab. Patterning is the most difficult process for finFETs. But another...

Q: Can you please tell us about your company and the specific problem or challenge that you are addressing? Eurocontrol Technics Group Inc (CVE:EUO) is a public company that trades on the TSX Venture Exchange in Canada and the OTCQB (EUCTF) market in...

The companies will cooperate in the fields of dimensional process control and automated in-line metrology under the Hexagon Metrology 360° SIMS (Smart In-line Measurement Solutions) brand. Hexagon Metrology and inos, a member of the Grenzebach group...

Only a direct measurement of SRAM structures can represent true variations of metal gate height due to CMP process and is strongly affected by the design and layout of pattern, including pattern density, dummy design, and spacing. By CHUN WEI HSU, United...

... new study There is an urgent need to create a new industrial paradigm in Sweden where not only environmental sustainability is safeguarded, but also new business models that secure long-term competitiveness. That is one of the key findings in the...